emerging technology in the semiconductor industry
The program of the event will try to solve challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.
Each year the community comes together to share and discuss current research, hear the latest breakthroughs, and connect with colleagues.
Yole Group will be part of the program with:

Taguhi YEGHOYAN,
Technology & Market Analyst, Semiconductor Manufacturing
Yole Intelligence part of Yole Group
Tuesday, February 28
Conference Presentation
03:40pm – 04:00pm PST: Photolithography equipment market and technology: State and challenges
ABSTRACT:
Photolithography equipment is the enabler of semiconductor device development. While i-line and DUV equipment replaces Mask Aligners to satisfy the overall miniaturization of More-than-Moore components (Power, RF, MEMS..), Advanced Packaging (AP) elaboration is tormented by multitude of challenges. Indeed, packaging is the limitation to performance of components manufactured with EUV lithography. Hence, AP architectures are flourishing, for which Laser Direct Imaging as well as i-line and DUV patterning are used. In this exciting time, we study photolithography equipment market, ecosystem and technology trends looking in detail into the forecast, market share, supply chain and auxiliary to patterning processes and equipment.
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Taguhi Yeghoyan
Technology & Market Analyst, Semiconductor Manufacturing
Taguhi Yeghoyan PhD., is a Technology & Market Analyst, Semiconductor Manufacturing at Yole Intelligence, part of Yole Group (Yole), within the Semiconductor, Memory & Computing division.
Taguhi’s mission is to follow daily the semiconductor industry and its evolution. Based on her expertise in this field, especially on the semiconductor value chain (processes, materials, equipment, and related applications), Taguhi performs technology & market reports and is engaged in dedicated custom projects.
Prior to Yole, she worked in world-class European research centers and laboratories, including imec (Belgium), LMI (Lyon, France) and LTM at CEA Leti (Grenoble, France). All along her past experiences, Taguhi has authored or co-authored two patents and more than nine papers.
She has graduated from Wroclaw University of Technology (Poland) and University of Lyon (France). Taguhi also completed her PhD. in Material Science from the University of Lyon (France).