Gigaphoton a manufacturer of lightsources for semiconductor lithography, announced that it will participate in SPIE Photomask Technology + EUV Lithography, which will be held at Monterey Conference Center, California, the United States on September 8.
SPIE Photomask Technology + EUV Lithography is one of the semiconductor mask industry’s leading international technical conferences, bringing together experts in photomask technology, EUV lithography, patterning, metrology, inspection, and process control.
At the conference, Gigaphoton will present its latest research and development results for new features of a high-brightness, compact LPP-EUV lightsource for actinic inspection. During this presentation, Gigaphoton will showcase its technologies and initiatives in the field of EUV mask inspection.
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