Technology, Process and Cost Comparison

LPDDR5(X) Comparison 2024

Comparison of leading edge 16Gb low power DRAM memory from high end smartphones using EUV and non EUV lithography manufacturing process.  

SPR24707

What's new?

  • 1B technology node
  • Higher memory  density
  • EUV lithography


Key Features:

  • Detailed photos
  • Precise measurements
  • Die analysis
  • Package analysis
  • Materials analysis
  • Manufacturing process flow 
  • Supply chain evaluation
  • Manufacturing cost analysis
  • Physical Comparison
  • Technical Comparisons
  • Cost Comparison


Report objectives:

The purpose of the analysis was to compare the memory die density, cell features, wafer cost, and die cost of leading edge memory from Micron, Samsung, and SK hynix extracted from high end smartphones. Additionally, it examines Micron’s manufacturing process choices of non EUV lithography in comparison to EUV adoption by Samsung and SK hynix.





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