Intel industry’s first mover on High NA EUV lithography system

Intel Foundry has received and assembled the industry’s first High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography system. The new tool provides the ability to dramatically improve resolution and feature scaling for the next generation of processors, enabling Intel Foundry to continue process leadership beyond Intel 18A.

High NA EUV is the next-generation lithography system developed by ASML following decades of collaboration with Intel. As the first mover on High NA EUV, Intel Foundry will be able to deliver never-before-seen precision and scalability in chip manufacturing. This in turn will allow Intel to develop chips with the most innovative features and capabilities – processors that are essential for driving advancements in AI and other emerging technologies.